User Manual

Stackable LCC/LCD Oven Owner’s Manual ASSEMBLY & SETUP

Version 1.1 33

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4.3.1. HEPA Filter Burn-Off

4.3.1.1. HEPA Filter Burn-Off Process

The burn-off process takes place in any equipment where a new HEPA filter is used at

temperatures above 180°C / 356°F. Expect smoke, possibly a pungent odor and a light residue on

interior surfaces. This results from oxidation of the binder. Most of the binder will leave the filter

after running at a temperature of 260°C/500°F for 48 hours. Check the oven for particles or the

exhaust for smoke and odor to determine that the process is finished.



While the High-temperature filter has undergone tempering

treatment at the factory, smells and/or fumes may be released

during the first use at temperature.

4.3.1.2. Location of HEPA Filter Burn-Off Process

Select a location for the burn-off process where generated smoke and odor will be ventilated with

the least amount of interruption and inconvenience. Ideally this will be in the final location for the

oven. However, it may be a receiving dock, some well ventilated space or even outside if the

weather is acceptable. If this location is a very clean area, pay special attention to an exhaust

hook-up that fully captures the smoke and odor produced. The post-Burn-off cleaning (that is,

oven wipe down) may also generate dust. So take care if in a clean room.

4.3.1.3. Recommended HEPA Filter Burn-Off Process

1. Locate the equipment exhaust opening where chamber air is being expelled.

a. If the oven filter is burned off in a clean area, be sure to handle the equipment exhaust

appropriately.

b. If the equipment is large and the exhaust stack is a permanent service connection, connect

the equipment and exhaust stack before the burn-off process.

c. If the equipment is small with no permanent exhaust duct required, arrange a temporary

connection out of the clean area that will handle the maximum temperature of the

equipment. Direct the smoke and odor outside, or to a highly ventilated area.

2. Set the temperature control at the maximum process temperature.

a. Silicone: Ramp at 1.25°C/min to 260°C and soak for 48 hours.

b. Media Pack: Ramp at 1.25°C/min to 260°C and soak for 48 hours.

c. High-temperature (Figure 14):

i. Option 1: Ramp at 1.7°C/min (or up to 5°C/min) to 350°C and soak for 48 hours.

ii. Option 2: Ramp to process temperature and soak for three consecutive three-hour

segments over 48 hours.



LCC oven chamber temperature transitions must not exceed

1.5°C/minute to maintain class 100 chamber conditions. For ramp

rates greater than 1.5°C/minute and up to 5°C/minute, the LCD model

will maintain class 100 chamber conditions.