HP Integrated Archive Platform Managing Repositories and Retention Whitepaper

5
Manually Creating Repositories
Additional repositories may be required to support compliance requirements of specific domains or
business units. These repositories must be manually created using the User Management >
Account Manager function in the Platform Control Center.
In the User Management / Accounts Manager window, select the Repository radio button. This
provides a view of all existing repositories as illustrated in Figure 1. To create a new repository, click
the Add Repository button in the bottom right of the screen. Selecting Add Repository presents
the “Adding a repository entry” form shown in Figure 2.
Figure 2: Creating a Repository
Populate the following fields in this form:
Name – Provide a name for the repository.
Domain – Select the IAP domain from the drop-down menu.
Retention – Enter a numeric value that specifies the number of days (e.g., 30 = 30 days). This
value cannot be lower than the retention period specified in the Domain.jcml file for the
type of repository being created (regulated or unregulated).
Type – Select the repository type from the drop-down menu. The following types are available
to choose from:
o Unregulated
 These repositories are subject to the retention schedule specified in the
Domain.jcml setting for unregulated repositories,
UnregulatedRetentionPeriodDays=.