Specifications

Database: Compendex
Compilation and indexing terms, © 2013 Elsevier Inc.
© 2013 Elsevier Inc. All rights reserved.
20130405 新增 10 条
1.
Accession number: 20131316153311
Title: Influence of pulse discharge strength on microstructure of Cr films deposited by
magnetron sputtering
Authors: Cao, Zheng1 ; Jiang, Bai-Ling1 ; Shen, Jian-Dong1 ; Ning, Fu-Ping1 ; Zhang, Qian1/曹政;
蒋百灵;沈建东;宁富平;张潜
Author affiliation: 1 School of Materials Science and Engineering, Xi'an University of
Technology, Xi'an 710016, China
Corresponding author: Jiang, B.-L. ([e-mail])
Source title: Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment
Abbreviated source title: Cailiao Rechuli Xuebao
Volume: 34
Issue: 2
Issue date: February 2013
Publication year: 2013
Pages: 157-161
Language: Chinese
ISSN: 10096264
CODEN: JRXUDO
Document type: Journal article (JA)
Publisher: Editorial Office of Transactions of Materials, 18 Xueqing Road, Beijing, 100083, China
Abstract: Cr films were deposited under three different Ar pulse abnormal glow discharge
strength conditions (monopulse peak target power density: 10 W/cm2, 30 W/cm2 and 70 W/cm2)
by increasing pulse target voltage (600 V, 700 V and 800 V) in pulse unbalanced magnetron
sputtering environment. SEM, AFM, XRD and TEM were used to compare the difference of
microstructure of the Cr films deposited under the different conditions. As Ar pulse abnormal
glow discharge was strength enhanced, Cr film deposition rate was increased dramatically.
Meanwhile, the surface roughness of the films was slightly increased. Moreover, the surface
particles size was homogeneous but not increased. Besides, preferred orientation Cr (110)
diffraction peak strength was decreased obviously, which meant crystallization effect becoming
worse. Cr films exhibited columnar growth and nanoscale grains (5-10 nm) were setting type
distribution into film.
Number of references: 19
Main heading: Deposits
Controlled terms: Film growth - Glow discharges - Magnetron sputtering -
Microstructure - Surface roughness
Uncontrolled terms: Abnormal glow discharge - CR film - Crystallization effects -
Preferred orientations - Pulse - Strength condition - Target power density -
Unbalanced magnetron sputtering
Classification code: 951 Materials Science - 933 Solid State Physics - 931.2 Physical